Gas-monitoring assembly comprising one or more gas sensors and one or more getters, and method of using same

ABSTRACT

The present invention relates to a gas-monitoring assembly and method for selectively determining the presence of a target gas in a gaseous environment that potentially comprises one or more interfering gases. Such gas-monitoring assembly and method specifically employ one or more gas sensors one or more getters arranged and constructed to reduce cross-interference caused by potential presence of the interfering gases in such gaseous environment to be monitored. The gas-monitoring assembly and method of the present invention are capable of monitoring a gaseous environment with respect to potential presence of multiple target gases that may interfere with one another.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to gas-monitoring assemblies and methods for selectively determining presence of one or more target gases in a gaseous environment, while reducing cross-interference caused by presence of one or more interfering gases in such gaseous environment.

2. Description of the Related Art

In order to protect workers against potential exposure to toxic and hazardous gases, toxic/hazardous gas monitoring (TGM) devices are commonly installed in workplace and other premises for monitoring the concentration of such toxic and hazardous gases thereat.

Conventional TGM devices employ molecular emission spectrometers for hydrogen-based gas detection. However, the introduction of hydrogen gas gives rise to additional safety concerns and requires implementation of additional safety measures to reduce risks associated with hydrogen gas.

New TGM systems employing electrochemical gas sensors can be advantageously used for monitoring toxic and hazardous gases, in place of the conventional hydrogen-based TGM devices. The use of electrochemical gas sensors eliminates the risks associated with hydrogen gas and therefore results in increased customer acceptance.

In electrochemical gas-sensing systems, a target gas contacts a measuring electrode of the electrochemical sensor, which responsively generates an electrical current that is proportional to the concentration of such target gas. For further details regarding electrochemical gas sensors, see U.S. Pat. No. 6,248,224 issued on Jun. 19, 2001 for “TOXIC SENSOR AND METHOD OF MANUFACTURE” and U.S. Pat. No. 6,423,209 issued on Jul. 23, 2002 for “ACID GAS MEASURING SENSORS AND METHOD OF USING SAME.”

However, gases that belong to the same chemical family often show similar or comparable reactions in the same electrochemical cell and cause cross-interference in the electrochemical measurement results. Currently available electrochemical gas sensors not only respond to the presence of a target gas, but also to presence of other gases of the same chemical family.

For example, an AsH₃ sensor responds not only responds to AsH₃ gas, but also to other hydride gases such as B₂H₆, SiH₄, and PH₃. The measuring electrode of such AsH₃ sensor reacts with the AsH₃ gas as follows: AsH₃+3H₂O→H₃AsO₃+6H⁺+6e⁻, while it also reacts with SiH₄, an interfering hydride, as follows: SiH₄+3H₂O→H₂SiO₃+8H⁺+8e⁻.

Therefore, the interfering gases will trigger the electrochemical gas sensor to generate signals indicating the presence of the target gas, even when the target gas is actually absent (i.e., false alarm).

It is therefore one object of the present invention to provide an apparatus and method for reducing such false alarm and increasing the selectivity of electrochemical gas sensors.

It is another object of the present invention to provide an apparatus and method for increasing selectivity of other types of gas sensors whose measurement results are similarly affected by presence of interfering gases and are prone to false alarm.

Other objects and advantages will be more fully apparent from the ensuring disclosure and appended claims.

SUMMARY OF THE INVENTION

The present invention in one aspect relates to a gas-monitoring assembly that comprises:

-   -   (a) one or more gas sensors for monitoring concentration of a         target gas in a gaseous environment, wherein the target gas         concentration detected by the gas sensors is susceptible to         influence by presence of one or more interfering gas species in         such gaseous environment;     -   (b) one or more getters coupled with such gas sensors and being         arranged and constructed to adsorb the target gas and/or the         interfering gas species upon detection of the target gas         concentration above a predetermined level in such gaseous         environment; and     -   (c) an analyzer coupled with the one or more gas sensors and the         one or more getters for selectively determining the presence of         the target gas in such gaseous environment, based on detected         changes in the target gas concentration caused by interaction of         the target gas with the one or more getters in relation to         target gas concentration absent such interaction.

The term “getter” as used herein refers to a material or an article that selectively adsorbs one or more gases and therefore is capable of selectively removing such gases from a gaseous mixture.

The terms “interfering gas species” and “interfering gas” are used interchangeably herein to refer to a gas that is different from the target gas to be detected but is capable of inducing responses in a target gas sensor in a manner that is identical or similar to the target gas.

Preferably, the target gas is a hydride gas, while the interfering gas species are one or more hydride gases that are different from the target gas.

More preferably, the target gas is a hydride gas selected from the group consisting of AsH₃, B₂H₆, and SiH₄, while the interfering gas species are selected from the same group of hydride gases but are different from the target gas.

The presence of the target gas in the gaseous environment can be directly determined by using a getter that selectively adsorbs the target gas (i.e., a target-specific getter). Specifically, when the gas sensor detects a high concentration (i.e., above a predetermined level) of the target gas in the gaseous environment, the target-specific getter is arranged and constructed for adsorbing the target gas. Within a predetermined time interval after interaction of such target-specific getter with the target gas, if the detected target gas concentration is found to reduce to below a predetermined threshold, the analyzer affirms the presence of the target gas in the gaseous environment; on the other hand, if the detected target gas concentration is found to remain equal to or above such predetermined threshold after expiration of such predetermined time interval, the analyzer does not affirm the presence of the target gas in the gaseous environment.

Alternatively, the presence of the target gas in the gaseous environment can be indirectly inferred by using a set of getters that include a first getter that adsorbs the target gas as well as the interfering gases and additional getters that each selectively adsorbs one of the interfering gases (i.e., interference-specific getter). Such first getter and the additional getters are sequentially employed to interact with the gaseous environment when the gas sensor detects a high concentration (i.e., above a predetermined level) of the target gas in the gaseous environment. Such first getter is associated with a first predetermined time interval and a predetermined concentration threshold, while each of such additional getters is associated with an additional predetermined time interval and an additional predetermined concentration threshold. The analyzer affirms the presence of the target gas in the gaseous environment, only if (1) the detected gas concentration is found to reduce below the first predetermined concentration threshold within the first predetermined time interval after employment of the first getter, and (2) the detected gas concentration is found to remain equal to or above the respective additional predetermined concentration threshold within the respective additional predetermined time interval after employment of each interference-specific getter. In all other situations, the analyzer does not affirm the presence of the target gas in the gaseous environment.

The gas-monitoring assembly described hereinabove preferably comprises an alarm device coupled with such analyzer, for generating an alarm signal whenever the presence of the target gas in the gaseous environment is affirmed by the analyzer.

The gas sensor of the present invention is preferably, but not necessarily, an electrochemical gas sensor that comprises an electrolyte in contact with a measuring electrode, a reference electrode, and a counter electrode.

In a specific embodiment of the present invention, the gas-monitoring assembly comprises an electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment, and a getter for selectively adsorbing AsH₃ gas.

In another specific embodiment of the present invention, the gas-monitoring assembly comprises an electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment, and a getter for selectively adsorbing B₂H₆ gas.

In yet another specific embodiment of the present invention, the gas-monitoring assembly comprises (1) an electrochemical gas sensor for monitoring concentration of SiH₄ gas in a gaseous environment, (2) a first getter for adsorbing AsH₃, B₂H₆, and SiH₄ gases, (3) a second getter for selectively adsorbing B₂H₆ gas, and (4) a third getter for selectively adsorbing AsH₃ gas.

The present invention in another aspect relates to a gas-monitoring assembly that comprises at least one gas sensor, at least one getter, and a control element, wherein the gas sensor monitors concentration of a target gas in a gaseous environment, wherein the getter comprises material that selectively adsorbs the target gas, and wherein the control element is coupled with the gas sensor and the getter for enabling interaction of the gaseous environment with the getter when the target gas concentration detected by the gas sensor exceeds a predetermined level.

The present invention in a further aspect relates to a gas-monitoring assembly that comprises at least one gas sensor and a gas analysis circuitry, wherein such gas sensor monitors concentration of a target gas in a gaseous environment, wherein the gas analysis circuitry comprises one or more getters, and wherein such gas analysis circuitry is activated upon detection of target gas concentration above a predetermined level, for selectively determining presence of the target gas in the gaseous environment while reducing potential cross-interference caused by presence of one or more interfering gas species in the gaseous environment.

The present invention in a still further aspect relates to a gas-monitoring assembly that comprises:

-   -   (a) multiple gas sensors, each of which monitors concentration         of one of multiple target gases in a gaseous environment,         wherein the concentration of each target gas detected by the         respective gas sensor is susceptible to influence by presence of         one or more other target gases in such gaseous environment;     -   (b) multiple getters coupled with such multiple gas sensors in         such manner that one or more of such multiple getters are         sequentially employed for adsorbing one or more of the target         gases upon detection of concentration of at least one target gas         above a predetermined level; and     -   (c) an analyzer coupled with such multiple gas sensors and such         multiple getters for selectively determining the presence of at         least one target gas in the gaseous environment, based on         detected changes in the concentration of such at least one         target gas caused by interaction of such at least one target gas         with such one or more getters in relation to target gas         concentration absent such interaction.

In a specific embodiment of the present invention, the above-described gas-monitoring assembly comprises: (1) a first electrochemical gas sensor for monitoring concentration of AsH₃ gas; (2) a second electrochemical gas sensor for monitoring concentration of B₂H₆ gas; (3) a third electrochemical gas sensor for monitoring concentration of SiH₄ gas, (4) a first getter the selectively adsorbs AsH₃ gas, (5) a second getter that selectively adsorbs B₂H₆ gas; and (6) a third getter that adsorbs AsH₃, B₂H₆, and SiH₄ gases.

For AsH₃ analysis, the first getter is employed for adsorbing the AsH₃ gas when concentration of the AsH₃ gas in a gaseous environment is found to exceed a predetermined level. Within a predetermined time interval (which is specific for AsH₃ analysis) after employment of the AsH₃ getter, if the detected AsH₃ concentration is found to reduce to below a predetermined threshold (which is specific for AsH₃ analysis), the analyzer affirms presence of the AsH₃ gas in such gaseous environment. On the other hand, if the detected AsH₃ within such time interval is found to remain equal to or above such predetermined threshold, the analytic element does not affirm the presence of the AsH₃ gas.

For B₂H₆ analysis, the second getter is employed for adsorbing the B₂H₆ gas when concentration of the B₂H₆ gas in the gaseous environment is found to exceed a predetermined level. Within a predetermined time interval (which is specific for B₂H₆ analysis) after employment of the B₂H₆ getter, if the detected B₂H₆ concentration is found to reduce to below a predetermined threshold (which is specific for B₂H₆ analysis), the analyzer affirms presence of the B₂H₆ gas in such gaseous environment. On the other hand, if the detected B₂H₆ within such time interval is found to remain equal to or above such predetermined threshold, the analytic element does not affirm the presence of the B₂H₆ gas.

For SiH₄ analysis, the first, second, and third getters are sequentially employed, either in a predetermined order or in a random order, for adsorbing the respective gases when concentration of the SiH₄ gas in the gaseous environment is found to exceed a predetermined level. The analyzer affirms the presence of the SiH₄ gas, only if (1) within a predetermined time interval (which is specific for SiH₄ analysis) after employment of the third getter, if the detected gas concentration is found to reduce to below a predetermined threshold (which is specific for SiH₄ analysis), and (2) within the respective predetermined time interval specific for AsH₃ or B₂H₆ analysis after employment of the respective AsH₃- or B₂H₆-specific getter, the detected gas concentration is found to remain equal to or above the predetermined threshold specific for AsH₃ or B₂H₆ analysis.

Another aspect of the present invention relates to a method for selectively determining presence of a target gas in a gaseous environment, comprising the steps of:

-   -   (a) monitoring concentration of the target gas in such gaseous         environment by using one or more gas sensors, wherein the target         gas concentration detected by the gas sensors is susceptible to         influence by presence of one or more interfering gas species in         such gaseous environment;     -   (b) coupling such gas sensors with one or more getters and an         analyzer;     -   (c) when the target gas concentration in the gaseous environment         is detected to exceed a predetermined level, employing such one         or more getters to adsorb the target gas and/or one or more         interfering gas species;     -   (d) selectively determining the presence of the target gas in         such gaseous environment by using the analyzer, based on         detected changes in the target gas concentration caused by         interaction of the target gas with such one or more getters in         relation to target gas concentration absent such interaction.

A further aspect of the present invention relates to a method for selectively determining presence of a target gas in a gaseous environment, comprising at least the steps of:

-   -   (a) monitoring concentration of the target gas in such gaseous         environment by using at least one gas sensor;     -   (b) coupling such at least one gas sensor with at least one         getter and a control element; and     -   (c) when the target gas concentration detected by the gas sensor         exceeds a predetermined level, employing the getter through the         control element to selectively adsorb the target gas.

A still further aspect of the present invention relates to a method for selectively determining presence of a target gas in a gaseous environment, comprising the steps of:

-   -   (a) monitoring concentration of the target gas in such gaseous         environment by using at least one gas sensor; and     -   (b) when the target gas concentration detected by the gas sensor         exceeds a predetermined level, activating a gas analysis         circuitry that comprises one or more getters for selectively         determining presence of the target gas in such gaseous         environment while reducing potential cross-interference caused         by presence of one or more interfering gas species in such         gaseous environment.

Yet another aspect of the present invention relates to a method for selectively determining presence of multiple target gases in a gaseous environment, comprising the steps of:

-   -   (a) monitoring concentrations of multiple target gases in the         gaseous environment, by using multiple gas sensors that each         monitor concentration of one of such multiple target gases,         wherein the concentration of each target gas detected by the         respective gas sensor is susceptible to influence by presence of         one or more other target gases in the gaseous environment;     -   (b) coupling such multiple gas sensors with multiple getters and         an analyzer;     -   (c) when concentration of at least one target gas is detected to         exceed a predetermined level, sequentially employing one or more         of such multiple getters so as to adsorb one or more of the         multiple target gases; and     -   (d) selectively determining the presence of such at least one         target gas by using the analyzer, based on detected changes in         the concentration of such at least one target gas caused by         interaction of such at least one target gas with the one or more         getters in relation to target gas concentration absent such         interaction.

Other aspects, features and embodiments of the present invention will be more fully apparent from the ensuing disclosure and appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A shows the gas flow in an illustrative gas-monitoring assembly that comprises a single gas sensor and a single getter before employment of the getter, according to one embodiment of the present invention.

FIG. 1B shows the gas flow in the gas-monitoring assembly of FIG. 1A after employment of the getter.

FIG. 2A shows the gas flow in an illustrative gas-monitoring assembly that comprises two gas sensors and a single getter before employment of the getter, according to one embodiment of the present invention.

FIG. 2B shows the gas flow in the gas-monitoring assembly of FIG. 2A after employment of the getter.

FIG. 3 illustratively shows a concentration response curve plotted for a target gas over time, which affirms the presence of such target gas in a gaseous environment being monitored.

FIG. 4 illustratively shows a concentration response curve plotted for a target gas over time, which does not affirm the presence of such target gas in a gaseous environment being monitored.

FIG. 5 illustratively shows another concentration response curve plotted for a target gas over time, which does not affirm the presence of such target gas in a gaseous environment being monitored.

FIG. 6 is a flow chart showing a process for selectively determining the presence of a target gas by using the gas-monitoring assembly of FIGS. 1A and 1B.

FIG. 7 shows the schematic view of a gas-monitoring assembly that comprises three gas sensors and three getters for selectively determining the presence of three different hydride gases, AsH₃, B₂H₆, and SiH₄, according to one embodiment of the present invention.

FIG. 8 is a flow chart showing a process for selectively determining the presence of AsH₃ gas by using the gas-monitoring assembly of FIG. 7.

FIG. 9 is a flow chart showing a process for selectively determining the presence of B₂H₆ by using the gas-monitoring assembly of FIG. 7.

FIGS. 10A-10B shows a flow chart depicting a process for selectively determining the presence of SiH₄ gas by using the gas-monitoring assembly of FIG. 7.

FIG. 11 shows the schematic view of a generalized gas-monitoring assembly that comprises multiple gas-monitoring elements and multiple getters for selectively determining the presence of multiple target gases, according to one embodiment of the present invention.

FIG. 12 shows an exemplary electrochemical gas sensor for monitoring concentration of a target gas, according to one embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION, AND PREFERRED EMBODIMENTS THEREOF

The contents of U.S. Pat. Nos. 6,248,224 and 6,423,209 are incorporated herein by reference in their entireties for all purposes.

The present invention advantageously combines one or more gas sensors with one or more getters to form a gas-monitoring assembly with a logical operation for selectively determining the presence of a target gas of interest in a gaseous environment (e.g., a gas stream or a gas-containing enclosure), while reducing cross-interference or false alarm caused by presence of one or more interfering gases in such gaseous environment.

FIGS. 1A and 1B illustratively show a gas-monitoring assembly 100 comprising a gas sensor S1 coupled with a getter G1. Two three-way valves V1 a and V1 b control gas flow through the gas sensor S1, and a getter valve VG1 controls gas flow through the getter G1. The gas sensor S1 functions to monitor the concentration of a target gas in a gaseous environment, which may also contain one or more interfering gas species that have influences upon the target gas concentration detected by the gas sensor S1 (i.e., causing cross-interference or false alarm). The getter G1, when employed, selectively adsorbs the target gas and reduces the target gas concentration.

A sample gas stream from a gaseous environment to be monitored can be first introduced into the gas-monitoring assembly 100 via an inlet, and then passed through the three-way valves V1 a-VIb and the gas sensor S1 (see FIG. 1A). Therefore, the gas sensor S1 continuously monitors the concentration of a target gas in the sample gas stream passed thereby. When the target gas concentration in such sample gas stream detected by S1 exceeds a predetermined level (i.e., an alarming concentration level), a control element (not shown) opens the getter valve VG1 and switches the two three-way valves V1 a-V1 b to redirect the sample gas stream first through the getter G1 and then through the gas sensor S1 (see FIG. 1B).

In such manner, the getter G1 is arranged and constructed to selectively adsorb the target gas from the redirected sample gas stream, thereby reducing the target gas concentration in such sample gas stream. The change in the target gas concentration caused by interaction of the target gas with the getter G1 can be readily detected by the gas sensor S1, and an analyzer coupled with both the gas sensor S1 and the getter G1 may selectively determine the presence of the target gas in the sample gas stream, based on such detected change in the target gas concentration. Specifically, in the event when the sample gas stream contains the target gas without any interfering gas species, the getter G1 will adsorb all or most of the target gas in such sample gas stream, and result in significantly large change in the target gas concentration as sensed by S1 after employment of such getter G1. However, in the event when the sample gas stream contains one or more interfering gas species that induces response in the gas sensor S1 and causes false alarm, the detected change in the target gas concentration as sensed by S1 after employment of the getter G1 will be relatively limited, because the getter G1 selectively adsorbs the target gas but not the interfering gases. Therefore, by observing the change in the target gas concentration after employment of the getter G1, the presence of the target gas versus that of the interfering gas species in the sample gas stream can be selectively determined to reduce cross-interference or false alarm caused by such interfering gases.

As shown hereinabove, the gas-monitoring assembly of the present invention operates in two alternative modes, i.e., a first gas-monitoring mode in which only the gas sensor S1 is employed, and a second gas-analyzing mode in which both the gas sensor S1 and the getter G1 are both employed. The getter G1 forms an analytical circuitry that is activated only upon detection of high target gas concentration in the sample gas stream by the gas sensor S1. Such analytical circuitry enables further analysis of the sample gas stream, so as to reduce potential cross-interference caused by presence of one or more interference gas species in such sample gas stream.

In the gas-monitoring assembly illustrated by FIGS. 1A and 1B, the gas sensor S1 functions to detect target gas concentration in the sample gas stream, both before and after employment of the getter G1.

Alternatively, the gas sensor S1 can be used only to detect the target gas concentration before employment of the getter G1, while an additional gas sensor S2, which is independent of S1, can be provided for monitoring the target gas concentration after employment of the getter G1, as shown in FIGS. 2A and 2B.

Specifically, FIGS. 2A and 2B illustratively show a gas-monitoring assembly 200 comprising two gas sensors S1-S2 and a getter G1.

A sample gas stream is first passed through two three-way valves V1 a-V1 b and the gas sensor S1 (see FIG. 2A), so that the gas sensor S1 monitors the concentration of a target gas in such sample gas stream. When the target gas concentration detected by S1 exceeds a predetermined level (i.e., an alarming concentration level), a control element (not shown) opens the getter valve VG1 and switches the three-way valves V1 a-V1 b to redirect the sample gas stream first through the getter G1 and then through the gas sensor S2 (see FIG. 2B).

In such manner, the getter G1 is arranged and constructed to selectively adsorb the target gas from the redirected sample gas stream, thereby reducing the target gas concentration in such sample gas stream. The reduced target gas concentration after employment of the getter G1 can be readily detected by the gas sensor S2 and compared to the target gas concentration detected by gas sensor S1 before employment of the getter G1. Difference in the target gas concentrations respectively detected by S1 and S2 reflects change in the target gas concentration caused by interaction of the target gas with the getter G1. An analyzer (not shown) coupled with both the gas sensors S1-S2 and the getter G1 can selectively determine the presence of the target gas in the sample gas stream, based on such target gas concentration change.

The analyzer of the present invention may be further coupled with an alarm device (not shown), which correspondingly generates an alarm signal indicated of the presence of the target gas in the sample gas stream.

Presence of the target gas in the sample gas stream can be selectively determined by the analyzer if the detected change in the target gas concentration caused by interaction of the target gas with the getter exceeds a predetermined value, or if the target gas concentration reduces to below a predetermined threshold within a predetermined time interval after employment of the getter.

In a preferred embodiment of the present invention, the presence of the target gas in the sample gas stream is selectively affirmed by the analyzer only if the target gas concentration reduces to below a predetermined threshold within a predetermined time interval (ΔT) after employment of the getter, as shown in FIG. 3.

Such predetermined concentration threshold and predetermined time interval are specific to the target gas of interest, and also depend on the types of getter materials used for forming the getter.

FIG. 4 depicts a situation wherein the target gas concentration does not reduce at all after employment of the getter, while FIG. 5 depicts a situation wherein the target gas concentration reduces in some degree after employment of the getter, but such reduction is insufficient to set the target gas concentration to below the predetermined threshold within the predetermined time interval (ΔT). In either situation, the analyzer does not affirm the presence of the target gas in the sample gas stream, and no alarm is generated.

FIG. 6 shows a flow chart illustrating a process for selectively determining the presence of a target gas by using the gas-monitoring assembly illustrated in FIGS. 1A and 1B, according to a specific embodiment of the present invention. Specifically, if the target gas concentration detected by the gas sensor S1 reduces to below a predetermined threshold after a predetermined time interval ΔT from the employment of the getter G1, an alarm indicative of the presence of the target gas in the sample gas stream is activated; on the other hand, if the target gas concentration detected by the gas sensor S1 does not reduce to below the predetermined threshold after the predetermined time interval ΔT, no alarm is generated.

In the above-described embodiments of the present invention, the presence of the target gas in a gaseous environment is directly determined by using a getter that selectively adsorbs the target gas (i.e., a target-specific getter). Alternatively, the presence of the target gas can be indirectly inferred by using a set of getters that include a first getter that adsorbs the target gas as well as the interfering gases and additional getters that each selectively adsorbs one of the interfering gases (i.e., interference-specific getter). Such first getter and the additional getters are sequentially employed when the gas sensor detects a high concentration of the target gas. Such first getter is associated with a first predetermined time interval and a predetermined concentration threshold, while each of such additional getters is associated with an additional predetermined time interval and an additional predetermined concentration threshold. The analyzer affirms the presence of the target gas in the gaseous environment, and an alarm is generated, only if (1) the detected gas concentration is found to reduce below the first predetermined concentration threshold within the first predetermined time interval after employment of the first getter, and (2) the detected gas concentration is found to remain equal to or above the respective additional predetermined concentration threshold within the respective additional predetermined time interval after employment of each interference-specific getter. In all other situations, the analyzer does not affirm the presence of the target gas, and no alarm is generated. Specific examples for indirectly inferring the presence of a target gas in a gaseous environment are described in detail in the ensuring paragraphs.

FIG. 7 illustrative shows a multi-channel gas-monitoring assembly 700, which comprises three different gas-monitoring channels C1, C2, and C3, for respectively monitoring and determining the presence of three different hydride gases, AsH₃, B₂H₆, and SiH₄ in a sample gas stream.

Each gas-monitoring channel comprises two three-way valves (V1 a, V1 b, V2 a, V2 b, V3 a, and V3 b), a gas sensor (S1 for sensing AsH₃ gas, S2 for sensing B₂H₆ gas, an

The gas sensors S1-S3 are preferably, but not necessarily electrochemical gas sensors that each comprises an electrolyte in contact with a measuring electrode, a reference electrode, and a counter electrode. Preferably, the AsH₃ gas sensor S1 comprises a measuring electrode containing a catalyst formed of noble metal or noble metal alloy, including but not limited to gold, silver, platinum, and alloys thereof. The B₂H₆ gas sensor S2 preferably comprises a measuring electrode containing a catalyst formed of noble metal or noble metal alloy, including but not limited to gold, silver, platinum, and alloys thereof. The SiH₄ gas sensor S3 preferably comprises a measuring electrode containing a catalyst formed of noble metal or noble metal alloy, including but not limited to gold, silver, platinum, and alloys thereof.

Each gas-monitoring channel is further coupled with a gas analysis circuitry that comprises one or more getters selected from the group consisting of an AsH₃ getter G1, a B₂H₆ getter G2, and a SiH₄ getter G3 with their respective getter valves VG1-VG3.

For example, the AsH₃ getter may comprise HgBr₂ material, which selectively adsorbs AsH₃ gas. Such HgBr₂ material is preferably supported on a fibrous substrate comprising high sodium glass wool. The B₂H₆ getter may comprise gamma Al₂O₃, which selectively adsorbs B₂H₆ gas. The SiH₄ getter may comprise AgNO₃ and Al(NO₃)₃ materials, which adsorbs SiH₄ as well as AsH₃ and B₂H₆ gases. Such AgNO₃ and Al(NO₃)₃ materials are preferably supported on a substrate comprising gamma Al₂O₃. Such getter materials may be disposed in a tubular housing made of polypropylene, through which a sample gas stream may be passed for selective absorption of the respective target gas.

The multi-channel gas-monitoring assembly 700 as shown in FIG. 7 may operate in two alternative states, i.e., a gas-monitoring state in which the gas sensors S1-S3 are employed while the getters G1-G3 are not, and a gas-analyzing state in which one of the gas analysis circuitries that comprises one or more getters G1-G3 becomes activated upon detection of high concentration of a target gas in the sample gas stream by one of the gas sensors S1-S3. Such analytical circuitries and the gas sensors S1-S3 are connected with an analyzer (not shown) with stored logical operations or gas analysis protocols for further analysis of the sample gas stream and selective determination of the presence of the respective target gas in the sample gas stream.

Further, two three-way valves VPa and VPb are preferably provided for passing a purge gas through the getters G1-G3 after each analysis cycle.

FIG. 8 shows a flow chart depicting a process for AsH₃ analysis by using the gas-monitoring assembly 700 depicted in FIG. 7. Specifically, such process initiates from a gas-monitoring state, in which the three-way valves V1 a, V1 b, V2 a, V2 b, V3 a, and V3 b of the gas-monitoring channels C1-C3 are arranged and constructed to allow the sample gas stream concurrently passing through the gas sensors S1-S3, while the getter valves VG1-VG3 are closed and the getters G1-G3 are isolated from the sample gas stream. When AsH₃ concentration in the sample gas stream is detected by the AsH₃ sensor S1 of the AsH₃-monitoring channel C1 as exceeding a predetermined level (i.e., an alarming concentration), a control element (not shown) opens the getter valve VG1 and switches the three-way valves V1 a and V1 b to redirect the sample gas stream first through the AsH₃ getter G1 and then through the AsH₃ sensor S1. In such manner, the AsH₃ analysis circuitry comprising the AsH₃ getter G1 is activated, and the AsH₃ analysis begins.

Upon activation of the AsH₃ analysis circuitry, a blocking signal is preferably generated to indicate that the AsH₃-monitoring channel C1 has switched from the gas-monitoring state to the gas-analyzing state.

After a predetermined time interval ΔT₁ (which is specific to AsH₃ and the AsH₃ getter used) from the employment of the AsH₃ getter G1, the AsH₃ sensor S1 is read to determine whether or not the AsH₃ gas concentration has reduced to below a predetermined threshold that is specific to AsH₃, which can be referred to herein as inquiry I.

If the AsH₃ sensor S1 provides a positive return (i.e., yes) to inquiry I, it means that the sample gas stream comprises primarily AsH₃ gas with little or no interfering gases, and an alarm is generated indicating the presence of AsH₃ in the sample gas stream.

If the AsH₃ sensor S1 provides a negative return (i.e., no) to inquiry I, it means that the sample gas stream comprises significant amount of interfering gases that cannot be removed by the AsH₃ getter G1, and no alarm is generated for AsH₃ gas.

Subsequently, the three-way valves V1 a and V1 b are switched back to their original settings to direct the sample gas flow through the AsH₃ sensor S1 separate from the AsH₃ getter G1, while the purge valves VPa and VPb are switched to pass a purge gas through the AsH₃ getter G1. After purging, the getter valve VG1 closes and thereby isolates the AsH₃ getter G1 from the rest of the system, and system continues the gas-analysis process by scanning other channels C2 and C3.

Further, the AsH₃ gas sensor S1 is read again to determine whether the detected gas concentration has reduced to zero or not, as stated in inquiry II: if yes, the blocking signal for the AsH₃-monitoring channel C1 can be removed, and such channel may return to the gas-monitoring state for subsequent gas-monitoring; if no, the system waits until the gas concentration reduces to zero and then removes the blocking signal.

FIG. 9 shows a flow chart depicting a process for B₂H₆ analysis by using the gas-monitoring assembly 700 depicted in FIG. 7. Specifically, such process initiates from the same gas-monitoring state as the AsH₃ analysis, in which the sample gas stream concurrently passing through the gas sensors S1-S3 of the gas-monitoring channels C1-C3, while the getters G1-G3 are isolated from the sample gas stream. When B₂H₆ concentration in the sample gas stream is detected by the B₂H₆ sensor S2 of the B₂H₆-monitoring channel C2 as exceeding a predetermined level (i.e., an alarming concentration), a control element (not shown) opens the getter valve VG2 and switches the three-way valves V2 a and V2 b to redirect the sample gas stream first through the B₂H₆ getter G2 and then through the B₂H₆ sensor S2. In such manner, the B₂H₆ analysis circuitry comprising the B₂H₆ getter G2 is activated, and the B₂H₆ analysis begins.

Upon activation of the B₂H₆ analysis circuitry, a blocking signal is preferably generated to indicate that the B₂H₆-monitoring channel C2 has switched from the gas-monitoring state to the gas-analyzing state.

After a predetermined time interval ΔT₂ (which is specific to B₂H₆ and the B₂H₆ getter used) from the employment of the B₂H₆ getter G2, the B₂H₆ sensor S2 is read to determine whether or not the B₂H₆ gas concentration has reduced to below a predetermined threshold that is specific to B₂H₆, which can be referred to herein as inquiry I.

If the B₂H₆ sensor S2 provides a positive return (i.e., yes) to inquiry I, it means that the sample gas stream comprises primarily B₂H₆ gas with little or no interfering gases, and an alarm is generated indicating the presence of B₂H₆ in the sample gas stream.

If the B₂H₆ sensor S2 provides a negative return (i.e., no) to inquiry I, it means that the sample gas stream comprises significant amount of interfering gases that cannot be removed by the B₂H₆ getter G2, and no alarm is generated for B₂H₆ gas.

Subsequently, the three-way valves V2 a and V2 b are switched back to their original settings to direct the sample gas flow through the B₂H₆ sensor S2 separate from the B₂H₆ getter G2, while the purge valves VPa and VPb are switched to pass a purge gas through the B₂H₆ getter G2. After purging, the getter valve VG2 B₂H₆ closes and thereby isolates the B₂H₆ getter G2 from the rest of the system, and system continues the gas-analysis process by scanning other channels C1 and C3.

Further, the B₂H₆ gas sensor S2 is read again to determine whether the detected gas concentration has reduced to zero or not, as stated in inquiry II: if yes, the blocking signal for the B₂H₆-monitoring channel C2 can be removed, and such channel may return to the gas-monitoring state for subsequent gas-monitoring; if no, the system waits until the gas concentration reduces to zero and then removes the blocking signal.

For SiH₄ analysis, if the SiH₄ getter G3 selectively adsorbs the SiH₄ gas but not the other hydrides such as AsH₃ and B₂H₆, the analytical process steps for SiH₄ is then substantially similar to those described for AsH₃ or B₂H₆ analysis, in which the presence of SiH₄ is directly determined based on the selective absorption of SiH₄ by the SiH₄ getter G3.

However, if the SiH₄ getter G3 adsorbs not only SiH₄ but also AsH₃ and B₂H₆ gases, a SiH₄ analytical circuitry comprising the SiH₄ getter G3, the B₂H₆ getter G2, and the AsH₃ getter G1 can be provided to indirectly infer the presence of SiH₄ in a sample gas stream that potentially contains SiH₄, AsH₃, or B₂H₆, based on logical exclusion as shown in FIGS. 10A and 10B.

Specifically, such SiH₄ analytical process initiates from the same gas-monitoring state as the AsH₃ and B₂H₆ analysis, in which a sample gas stream is concurrently passing through the gas sensors S1-S3 of the gas-monitoring channels C1-C3, while the getters G1-G3 are isolated from the sample gas stream.

When SiH₄ concentration in the sample gas stream is detected by the SiH₄ sensor S3 of the SiH₄-monitoring channel C3 as exceeding a predetermined level (i.e., an alarming concentration), a control element (not shown) opens the getter valve VG3 and switches the three-way valves V3 a and V3 b to redirect the sample gas stream first through the SiH₄ getter G3 and then through the SiH₄ sensor S3. In such manner, the SiH₄ analysis begins by sequentially employing the SiH₄ getter G3, the B₂H₆ getter G2, the AsH₃ getter G1 contained in the SiH₄ analysis circuitry to interact with the sample gas stream.

It is important to note that although the sequential employment of the getters G1-G3 preferably proceeds in a predetermined order, such as G3→G2→G1 or G1→G2→G3, it may proceed in any random order without limitation, and the analytical logic can be readily modified by a person ordinarily skilled in the art to adapt to any specific order.

Upon activation of the SiH₄ analysis circuitry, a blocking signal is preferably generated to indicate that the SiH₄-monitoring channel C3 has switched from the gas-monitoring state to the gas-analyzing state.

After a predetermined time interval ΔT₃ (which is specific to SiH₄ and the SiH₄ getter used) from the employment of the SiH₄ getter G3, the SiH₄ sensor S3 is read to determine whether or not the SiH₄ gas concentration has reduced to below a predetermined threshold that is specific to SiH₄, which can be referred to herein as inquiry I.

If the SiH₄ sensor S3 provides a negative return (i.e., no) to inquiry I, it means that the sample gas stream contains significant amount of interfering gases that are not SiH₄, B₂H₆, or AsH₃ and cannot be removed by the SiH₄ getter G3, and no alarm is generated for SiH₄ gas.

If the SiH₄ sensor S3 provides a positive return (i.e., yes) to inquiry I, it means that the sample gas stream contains SiH₄, B₂H₆, or AsH₄ gas with little or no other interfering gases, and the system proceeds further to determine whether the sample gas stream comprises primarily B₂H₆, by closing the getter valve VG3 and opening the getter valve VG2 to redirect the sample gas stream first through the B₂H₆ getter G2 and then the SiH₄ sensor S3. In such manner, the B₂H₆ getter G2 contained in the SiH₄ analytical circuitry is employed.

After a predetermined time interval ΔT₂ (which is specific to B₂H₆ and the B₂H₆ getter used) from the employment of the B₂H₆ getter G2, the SiH₄ sensor S3 is read to determine whether or not the detected gas concentration has reduced to below a predetermined threshold that is specific to B₂H₆, which can be referred to herein as inquiry II.

If the SiH₄ sensor S3 provides a positive return (i.e., yes) to inquiry II, it means that the sample gas stream comprises primarily B₂H₆ gas with little or no other hydride gases, and therefore no alarm is generated for SiH₄ gas.

If the SiH₄ sensor S3 provides a negative return (i.e., no) to inquiry II, it means that the sample gas stream comprises significant amount of hydride gas(es) that is not B₂H₆ and cannot be removed by the B₂H₆ getter G2, and the system proceeds further to determine whether the sample gas stream comprises primarily AsH₃, by closing the getter valve VG2 and opening the getter valve VG1 to redirect the sample gas stream first through the AsH₃ getter G1 and then the SiH₄ sensor S3. In such manner, the AsH₃ getter G1 contained in the SiH₄ analytical circuitry is employed.

After a predetermined time interval ΔT₁ (which is specific to AsH₃ and the AsH₃ getter used) from the employment of the AsH₃ getter G1, the SiH₄ sensor S3 is read to determine whether or not the detected gas concentration has reduced to below a predetermined threshold that is specific to AsH₃, which can be referred to herein as inquiry III.

If the SiH₄ sensor S3 provides a positive return (i.e., yes) to inquiry III, it means that the sample gas stream comprises primarily AsH₃ gas with little or no other hydride gases, and therefore no alarm is generated for SiH₄ gas.

If the SiH₄ sensor S3 provides a negative return (i.e., no) to inquiry III, it means that the sample gas stream comprises significant amount of hydride gas(es) that is not AsH₃ and cannot be removed by the AsH₃ getter G1. At this point, it is determined that the sample gas stream likely contains SiH₄ gas, based on the observations that (1) the sample gas stream contains SiH₄, B₂H₆, or AsH₄ gas with little or no other interfering gases; (2) the sample gas stream comprises significant amount of hydride gas(es) that is not B₂H₆, and (3) the sample gas stream comprises significant amount of hydride gas(es) that is not AsH₃, as obtained from the above-described analytical steps. Consequently, an alarm can be generated to indicate the presence of SiH₄ gas in the sample gas stream.

Subsequently, the three-way valves V3 a and V3 b are switched back to their original settings to direct the sample gas flow through the SiH₄ sensor S3 separate from the AsH₃ getter G1, while the purge valves VPa and VPb and all the getter valves VG1-VG3 are opened to pass the purge gas through all the getters G1-G3 that have been used during the SiH₄ analysis. After purging, the getter valves VG1-VG3 are closed and thereby isolate the respective getters G1-G3 from the rest of the system, and system continues the gas-analysis process by scanning other channels C1 and C2.

Further, the SiH₄ gas sensor S3 is read again to determine whether the detected gas concentration has reduced to zero or not, as stated in inquiry IV: if yes, the blocking signal for the SiH₄-monitoring channel C3 can be removed, and such channel may return to the gas-monitoring state for subsequent gas-monitoring; if no, the system waits until the gas concentration reduces to zero and then removes the blocking signal.

Although the above-description is directed primarily to detection of hydride gases such as AsH₃, B₂H₆, and SiH₄, etc., the present invention is also applicable to various different target gas species, including but not limited to other hydrides, halogens, mineral acids, fluorinated hydrocarbons, ammonia, etc., and their respective derivatives, and a person ordinarily skilled in the art can readily modify the configurations of the gas-sensing assemblies as described hereinabove for detection and analysis of specific target gas species, consistent with the principles of the present invention.

FIG. 11 therefore depicts a generalized multi-channel gas-monitoring assembly 1100, which comprises n different gas-monitoring channels, each of which contains valves Via and Vib, gas sensor Si, flow meter Fi, and pump Pi (wherein i is from 1 to n), and each of which is coupled with a gas analysis circuitry that comprises one or more getters selected from G1-Gm, while each getter Gj can be exposed to and isolated from the rest of the assembly 1100 by a getter valve VGj (wherein j is from 1 to m). The purge valves VPa and VPb function to purge the getters contained the respective gas analysis circuitry after each gas analysis cycle.

The gas sensing elements S1-Sn preferably comprises one or more electrochemical gas sensors as illustrated in FIG. 12.

Specifically, the electrochemical gas sensor 1200 of FIG. 12 comprises a measuring electrode 1220 comprising a catalyst to sense one or more suitable target gases. Such measuring electrode 1220 is preferably positioned inside a sensor cell 1202 and conductively coupled to a sensor operating circuitry 1205. Sensor operating circuitry 1205 for one embodiment may also be coupled to or in wireless communication with an output device 1280. Output device 1280 may be local to or remote from sensor operating circuitry 1205 and may or may not be a component of sensor 1200.

Sensor cell 1202 further comprises a reference electrode 1230, a counter electrode 1240, an electrolyte 1250, and electrical contacts 1222, 1232, and 1242. Although described as having three electrodes, sensor cell 1202 for another embodiment may have only two electrodes or may have more than three electrodes. Sensor cell 1202 for another embodiment may not have reference electrode 1230, for example.

The sensor cell 1202 defines an electrolyte reservoir of any suitable size and shape to hold electrolyte 1250 and is configured to help support measuring electrode 1220, reference electrode 1230, and counter electrode 1240 such that at least a portion of each of measuring electrode 1220, reference electrode 1230, and counter electrode 1240 are coupled to electrolyte 1250. The measuring electrode 1220 may be supported in any suitable position in the electrolyte reservoir such that at least a portion of measuring electrode 1220 is immersed in electrolyte 1250. The reference electrode 1230 and counter electrode 1240 may also be supported in any suitable position in the electrolyte reservoir such that both reference electrode 1230 and counter electrode 1240 are immersed in electrolyte 1250.

Measuring electrode 1220, reference electrode 1230, and counter electrode 1240 for one embodiment may each have any suitable size and shape for positioning in the electrolyte reservoir. Where the electrolyte reservoir is shaped as a hollowed cylinder, for example, measuring electrode 1220 for one embodiment may be disc-shaped and reference electrode 1230 and counter electrode 1240 for one embodiment may be ring-shaped or disc-shaped.

The sensor cell 1202 in one embodiment comprises an opening 1212 of any suitable size and shape through which a target gas may pass from an external environment to contact measuring electrode 1220. For one embodiment, a membrane 1224 is provided in any suitable position relative to opening 1212 and to measuring electrode 1220 to allow a target gas to diffuse through membrane 1224 to measuring electrode 1220 and to help prevent electrolyte 1250 from passing through membrane 1224 and out of the electrolyte reservoir. Membrane 1224 for one embodiment, as illustrated in FIG. 12, may be coupled to measuring electrode 1220. Membrane 1224 may be formed from any suitable material, such as polytetrafluoroethylene (PTFE) for example.

An optional chemical filter 1214 may be provided in any suitable position relative to opening 1212 to help prevent one or more poisons that may damage measuring electrode 1220 and/or one or more potentially interfering non-target gases that may otherwise be sensed by measuring electrode 1220 as target particles from reaching measuring electrode 1220. An optional dust filter 1216 may also be provided in any suitable position relative to opening 1212 to help prevent dust, dirt, mites, etc. from interfering with sensor cell 1202.

Reference electrode 1230 may be formed in any suitable manner from any suitable material. Reference electrode 1230 for one embodiment may be formed similarly as measuring electrode 1220. Reference electrode 1230 for one embodiment may be formed by mixing a suitable powder or powder mixture for reference electrode 1230 with a powder or emulsion of a suitable binder material, such as polytetrafluoroethylene (PTFE) for example, to produce an emulsion that may be spread onto a suitable porous substrate 1234 for mechanical strength. Substrate 1234 for one embodiment may also serve as a diffusion barrier. Substrate 1234 for one embodiment may then be subjected to a suitable heat treatment to help bond the emulsion to the substrate and remove solvents. Substrate 1234 may be formed from any suitable material, such as polytetrafluoroethylene (PTFE) for example.

Counter electrode 1240 may be formed in any suitable manner from any suitable material that may depend, for example, on the reaction to be catalyzed by counter electrode 1240. Further, a suitable membrane 1244 may be provided in any suitable position relative to the opening 1212 and to counter electrode 1240 to allow gases (such as oxygen gas or moisture) necessary for the electrochemical reactions to diffuse therethrough to counter electrode 1240 and to help prevent electrolyte 1250 from passing out of the electrolyte reservoir.

Counter electrode 1240 for one embodiment may be formed by mixing a suitable powder or powder mixture for counter electrode with a powder or emulsion of a suitable binder material, such as polytetrafluoroethylene (PTFE) for example, to produce an emulsion that may be spread onto a suitable porous substrate 1244 for mechanical strength. Substrate 1244 for one embodiment may also serve as a diffusion barrier. Substrate 1244 for one embodiment may then be subjected to a suitable heat treatment to help bond the emulsion to the substrate and remove solvents. Substrate 1244 may be formed from any suitable material, such as polytetrafluoroethylene (PTFE) for example.

The measuring electrode 1220, reference electrode 1230, and counter electrode 1240 may be coupled with the electrolyte 1250 in any other suitable manner. For example, the measuring electrode 1220, reference electrode 1230, and/or counter electrode 1240 external to an electrolyte reservoir may be coupled with an electrolyte through wetting filters or porous walls that help to define the reservoir.

Electrical contacts 1222, 1232, and 1242 are conductively coupled to measuring electrode 1220, reference electrode 1230, and counter electrode 1240, respectively. Electrical contacts 1222, 1232, and 1242 are to be conductively coupled to sensor operating circuitry 1205 to conductively couple measuring electrode 1220, reference electrode 1230, and counter electrode 1240, respectively, to sensor operating circuitry 1205. Electrical contacts 1222, 1232, and 1242 may be shaped as pins for insertion into corresponding socket openings of a connector for sensor operating circuitry 1205, in a specific embodiment of the present invention. Electrical contacts 1222, 1232, and 1242 for another embodiment may be shaped in any other suitable manner.

For another embodiment, sensor operating circuitry 1205 may be directly coupled to measuring electrode 1220, reference electrode 1230, and counter electrode 1240.

Sensor operating circuitry 1205 functions to operate sensor 1200 to sense one or more target gases in a gaseous environment near sensor cell 1202. Sensor operating circuitry 1205 may be conductively coupled to sensor cell 1202 either locally in or near the same environment or remotely.

While the invention has been described herein with reference to specific aspects, features and embodiments, it will be recognized that the invention is not thus limited, but rather extends to and encompasses other variations, modifications and alternative embodiments. Accordingly, the invention is intended to be broadly interpreted and construed to encompass all such other variations, modifications, and alternative embodiments, as being within the scope and spirit of the invention as hereinafter claimed. 

1. A gas-monitoring assembly comprising: (a) one or more gas sensors for monitoring concentration of a target gas in a gaseous environment, wherein the target gas concentration detected by said gas sensors is susceptible to influence by presence of one or more interfering gas species in said gaseous environment; (b) one or more getters coupled with said gas sensors and being arranged and constructed to adsorb the target gas and/or said one or more interfering gas species upon detection of the target gas concentration above a predetermined level in said gaseous environment; and (c) an analyzer coupled with said one or more gas sensors and said one or more getters for selectively determining the presence of the target gas in said gaseous environment, based on detected changes in the target gas concentration caused by interaction of the target gas with said one or more getters in relation to target gas concentration absent such interaction.
 2. The gas-monitoring assembly of claim 1, wherein the target gas comprises a hydride gas, and wherein the interfering gas species comprise one or more hydride gases that are different from the target gas.
 3. The gas-monitoring assembly of claim 1, wherein the target gas comprises a hydride gas selected from the group consisting of AsH₃, B₂H₆, and SiH₄, wherein the interfering gas species comprise one or more hydride gases selected from the group consisting of AsH₃, B₂H₆, and SiH₄ that are different from the target gas.
 4. The gas-monitoring assembly of claim 1, further comprising an alarm device coupled with said analyzer for generating an alarm signal indicative of the presence of the target gas in said gaseous environment.
 5. The gas-monitoring assembly of claim 1, comprising at least one getter that selectively adsorbs the target gas, wherein the analyzer determines the presence of the target gas in said gaseous environment if the detected target gas concentration reduces to below a predetermined threshold within a predetermined time interval after employment of said at least one getter.
 6. The gas-monitoring assembly of claim 1, comprising (1) a first getter that adsorbs the target gas and said one or more interfering gas species, and (2) one or more additional getters that each selectively adsorbs one of said interfering gas species, wherein the analyzer determines the presence of the target gas in said gaseous environment if (i) the detected target gas concentration reduces to below a first predetermined threshold within a first predetermined time interval after employment of said first getter, and (ii) the detected target gas concentration remains above respective additional predetermined threshold within respective additional predetermined time interval after employment of each additional getter.
 7. The gas-monitoring assembly of claim 1, comprising at least one electrochemical gas sensor coupled with at least one getter.
 8. The gas-monitoring assembly of claim 7, wherein said electrochemical gas sensor comprises an electrolyte that is in contact with a measuring electrode, a reference electrode, and a counter electrode.
 9. The gas-monitoring assembly of claim 1, comprising (1) an electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment, and (2) a getter that selectively adsorbs AsH₃ gas.
 10. The gas-monitoring assembly of claim 9, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 11. The gas-monitoring assembly of claim 9, wherein the getter comprises HgBr₂.
 12. The gas-monitoring assembly of claim 11, wherein said getter further comprises a sodium-glass substrate.
 13. The gas-monitoring assembly of claim 1, comprising (1) an electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment, and (2) a getter that selectively adsorbs B₂H₆ gas.
 14. The gas-monitoring assembly of claim 13, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 15. The gas-monitoring assembly of claim 13, wherein the getter comprises gamma Al₂O₃.
 16. The gas-monitoring assembly of claim 1, comprising (1) an electrochemical gas sensor for monitoring concentration of SiH₄ gas in a gaseous environment, (2) a first getter that adsorbs AsH₃, B₂H₆, and SiH₄ gases, (3) a second getter that selectively adsorbs B₂H₆ gas, and (4) a third getter that selectively adsorbs B₂H₆ gas.
 17. The gas-monitoring assembly of claim 16, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 18. The gas-monitoring assembly of claim 16, wherein the first getter comprises AgNO₃ and Al(NO₃)₃.
 19. The gas-monitoring assembly of claim 18, wherein said first getter further comprises a gamma Al₂O₃ substrate.
 20. The gas-monitoring assembly of claim 16, wherein the second getter comprises gamma Al₂O₃.
 21. The gas-monitoring assembly of claim 16, wherein the third getter comprises HgBr₂.
 22. The gas-monitoring assembly of claim 21, wherein said third getter further comprises a sodium-glass substrate.
 23. A gas-monitoring assembly comprising at least one gas sensor, at least one getter, and a control element, wherein said gas sensor monitors concentration of a target gas in a gaseous environment, wherein the getter comprises material that selectively adsorbs the target gas, and wherein the control element is coupled with said gas sensor and said getter for interacting said getter with the gaseous environment when the target gas concentration detected by the gas sensor exceeds a predetermined level.
 24. The gas-monitoring assembly of claim 23, wherein the target gas comprises a hydride gas.
 25. The gas-monitoring assembly of claim 23, wherein the target gas comprises a hydride gas selected from the group consisting of AsH₃, B₂H₆, and SiH₄.
 26. The gas-monitoring assembly of claim 23, comprising at least one electrochemical gas sensor.
 27. The gas-monitoring assembly of claim 26, wherein said electrochemical gas sensor comprises an electrolyte that is in contact with a measuring electrode, a reference electrode, and a counter electrode.
 28. The gas-monitoring assembly of claim 23, comprising (1) an electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment, and (2) a getter that selectively adsorbs AsH₃ gas.
 29. The gas-monitoring assembly of claim 28, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 30. The gas-monitoring assembly of claim 28, wherein the getter comprises HgBr₂.
 31. The gas-monitoring assembly of claim 28, wherein said getter further comprises a sodium-glass substrate.
 32. The gas-monitoring assembly of claim 23, comprising (1) an electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment, and (2) a getter that selectively adsorbs B₂H₆ gas.
 33. The gas-monitoring assembly of claim 32, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 34. The gas-monitoring assembly of claim 32, wherein the getter comprises gamma Al₂O₃.
 35. A gas-monitoring assembly comprising at least one gas sensor and a gas analysis circuitry, wherein said gas sensor monitors concentration of a target gas in a gaseous environment, wherein the gas analysis circuitry comprises one or more getters, and wherein said gas analysis circuitry is activated upon detection of target gas concentration above a predetermined level, for selectively determining presence of the target gas in said gaseous environment while reducing potential cross-interference caused by presence of one or more interfering gas species in said gaseous environment.
 36. The gas-monitoring assembly of claim 35, wherein the target gas comprises a hydride gas, and wherein the interfering gas species comprise one or more hydride gases that are different from the target gas.
 37. The gas-monitoring assembly of claim 35, wherein the target gas comprises a hydride gas selected from the group consisting of AsH₃, B₂H₆, and SiH₄, wherein the interfering gas species comprise one or more hydride gases selected from the group consisting of AsH₃, B₂H₆, and SiH₄ that are different from the target gas.
 38. The gas-monitoring assembly of claim 35, further comprising an alarm device coupled with said gas analysis circuitry for generating an alarm signal indicative of the presence of the target gas in said gaseous environment.
 39. The gas-monitoring assembly of claim 35, wherein said gas analysis circuitry comprises at least one getter that selectively adsorbs the target gas, wherein the presence of the target gas in said gaseous environment is selectively determined if the detected target gas concentration reduces to below a predetermined threshold within a predetermined time interval after employment of said at least one getter.
 40. The gas-monitoring assembly of claim 35, wherein said gas analysis circuitry comprises (1) a first getter that adsorbs the target gas and said one or more interfering gas species, and (2) one or more additional getters that each selectively adsorbs one of said interfering gas species, wherein the presence of the target gas in said gaseous environment is selectively determined if (i) the detected target gas concentration reduces to below a first predetermined threshold within a first predetermined time interval after employment of said first getter, and (ii) the detected target gas concentration remains above respective additional predetermined threshold within respective additional predetermined time interval after employment of each additional getter.
 41. The gas-monitoring assembly of claim 35, comprising at least one electrochemical gas sensor.
 42. The gas-monitoring assembly of claim 41, wherein said electrochemical gas sensor comprises an electrolyte that is in contact with a measuring electrode, a reference electrode, and a counter electrode.
 43. The gas-monitoring assembly of claim 35, comprising an electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment, wherein the gas analysis circuitry comprises a getter that selectively adsorbs AsH₃ gas.
 44. The gas-monitoring assembly of claim 43, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 45. The gas-monitoring assembly of claim 43, wherein the getter comprises HgBr₂.
 46. The gas-monitoring assembly of claim 43, wherein said getter further comprises a sodium-glass substrate.
 47. The gas-monitoring assembly of claim 35, comprising an electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment, wherein the gas analysis circuitry comprises a getter that selectively adsorbs B₂H₆ gas.
 48. The gas-monitoring assembly of claim 47, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 49. The gas-monitoring assembly of claim 47, wherein the getter comprises gamma Al₂O₃.
 50. The gas-monitoring assembly of claim 35, comprising an electrochemical gas sensor for monitoring concentration of SiH₄ gas in a gaseous environment, wherein the gas analysis circuitry comprises a first getter that adsorbs AsH₃, B₂H₆, and SiH₄ gases, a second getter that selectively adsorbs B₂H₆ gas, and a third getter that selectively adsorbs B₂H₆ gas.
 51. The gas-monitoring assembly of claim 50, wherein said electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 52. The gas-monitoring assembly of claim 50, wherein the first getter comprises AgNO₃ and Al(NO₃)₃.
 53. The gas-monitoring assembly of claim 52, wherein said first getter further comprises a gamma Al₂O₃ substrate.
 54. The gas-monitoring assembly of claim 50, wherein the second getter comprises gamma Al₂O₃.
 55. The gas-monitoring assembly of claim 50, wherein the third getter comprises HgBr₂.
 56. The gas-monitoring assembly of claim 55, wherein said third getter further comprises a sodium-glass substrate.
 57. A gas-monitoring assembly comprising: (a) multiple gas sensors, each of which monitors concentration of one of multiple target gases in a gaseous environment, wherein the concentration of each target gas detected by the respective gas sensor is susceptible to influence by presence of one or more other target gases in said gaseous environment; (b) multiple getters coupled with said multiple gas sensors in such manner that one or more of said multiple getters are sequentially employed for adsorbing one or more of said target gases upon detection of concentration of at least one target gas above a predetermined level; and (c) an analyzer coupled with said multiple gas sensors and said multiple getters for selectively determining the presence of at least one target gas in said gaseous environment, based on detected changes in the concentration of said at least one target gas caused by interaction of said at least one target gas with said one or more getters in relation to target gas concentration absent said interaction.
 58. The gas-monitoring assembly of claim 57, wherein the target gases comprise hydride gases.
 59. The gas-monitoring assembly of claim 57, wherein the target gases comprise hydride gases selected from the group consisting of AsH₃, B₂H₆, and SiH₄.
 60. The gas-monitoring assembly of claim 57, further comprising an alarm device coupled with said analyzer for generating an alarm signal indicative of the presence of said at least one target gas in said gaseous environment.
 61. The gas-monitoring assembly of claim 57, comprising at least one getter that selectively adsorbs one of the target gases, wherein the analyzer determines the presence of said one of the target gases in said gaseous environment if the detected concentration of said one of the target gases reduces to below a predetermined threshold within a predetermined time interval after employment of said at least one getter.
 62. The gas-monitoring assembly of claim 57, comprising at least one electrochemical gas sensor.
 63. The gas-monitoring assembly of claim 62, wherein said electrochemical gas sensor comprises an electrolyte that is in contact with a measuring electrode, a reference electrode, and a counter electrode.
 64. The gas-monitoring assembly of claim 57, comprising: (1) a first electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment; (2) a second electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment; (3) a third electrochemical gas sensor for monitoring concentration of SiH₄ gas in a gaseous environment; (4) a first getter that selectively adsorbs AsH₃ gas; (5) a second getter that selectively adsorbs B₂H₆ gas; and (6) a third getter that adsorbs AsH₃, B₂H₆, and SiH₄ gases.
 65. The gas-monitoring assembly of claim 64, wherein said first electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 66. The gas-monitoring assembly of claim 64, wherein said second electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 67. The gas-monitoring assembly of claim 64, wherein said third electrochemical gas sensor comprises a measuring electrode containing a catalyst selected from the group consisting of gold, silver, platinum, and alloys thereof.
 68. The gas-monitoring assembly of claim 64, wherein the first getter comprises HgBr₂.
 69. The gas-monitoring assembly of claim 68, wherein said first getter further comprises a sodium-glass substrate.
 70. The gas-monitoring assembly of claim 64, wherein the second getter comprises gamma Al₂O₃.
 71. The gas-monitoring assembly of claim 64, wherein the third getter comprises AgNO₃ and Al(NO₃)₃.
 72. The gas-monitoring assembly of claim 71, wherein said third getter further comprises a gamma Al₂O₃ substrate.
 73. A method for selectively determining presence of a target gas in a gaseous environment, comprising the steps of: (a) monitoring concentration of the target gas in said gaseous environment by using one or more gas sensors, wherein the target gas concentration detected by said gas sensors is susceptible to influence by presence of one or more interfering gas species in said gaseous environment; (b) coupling said gas sensors with one or more getters and an analyzer; (c) when the target gas concentration in said gaseous environment is detected to exceed a predetermined level, employing said one or more getters to adsorb the target gas and/or said one or more interfering gas species; (d) selectively determining the presence of the target gas in said gaseous environment by using said analyzer, based on detected changes in the target gas concentration caused by employment of each of said one or more getters.
 74. A method for selectively determining presence of a target gas in a gaseous environment, comprising at least the steps of: (a) monitoring concentration of the target gas in said gaseous environment by using at least one gas sensor; (b) coupling said at least one gas sensor with at least one getter and a control element; and (c) when the target gas concentration detected by said gas sensor exceeds a predetermined level, employing said getter through the control element to selectively adsorb the target gas.
 75. A method for selectively determining presence of a target gas in a gaseous environment, comprising the steps of: (a) monitoring concentration of the target gas in said gaseous environment by using at least one gas sensor; and (b) when the target gas concentration detected by said gas sensor exceeds a predetermined level, activating a gas analysis circuitry that comprises one or more getters for selectively determining presence of the target gas in said gaseous environment while reducing potential cross-interference caused by presence of one or more interfering gas species in said gaseous environment.
 76. A method for selectively determining presence of multiple target gases in a gaseous environment, comprising the steps of: (a) monitoring concentrations of said multiple target gases in the gaseous environment, by using multiple gas sensors that each monitor concentration of one of said multiple target gases, wherein the concentration of each target gas detected by the respective gas sensor is susceptible to influence by presence of one or more other target gases in said gaseous environment; (b) coupling said multiple gas sensors with multiple getters and an analyzer; (c) when concentration of at least one target gas is detected to exceed a predetermined level, sequentially employing one or more of said multiple getters to adsorb one or more of the multiple target gases; and (d) selectively determining the presence of said at least one target gas by using the analyzer, based on detected changes in the concentration of said at least one target gas caused by employment of each of said one or more getters.
 77. The method of claim 76, wherein said analyzer contains stored gas analysis protocols for selectively determining the presence of each of said multiple target gases.
 78. The method of claim 76, wherein the target gases comprise hydride gases selected from the group consisting of AsH₃, B₂H₆, and SiH₄.
 79. The method of claim 77, wherein the concentrations of said target gases are monitored by (1) a first electrochemical gas sensor for monitoring concentration of AsH₃ gas in a gaseous environment; (2) a second electrochemical gas sensor for monitoring concentration of B₂H₆ gas in a gaseous environment; and (3) a third electrochemical gas sensor for monitoring concentration of SiH₄ in a gaseous environment.
 80. The method of claim 77, wherein said multiple gas sensors are coupled with multiple getters that include (1) a first getter that selectively adsorbs AsH₃ gas; (2) a second getter that selectively adsorbs B₂H₆ gas; and (3) a third getter that adsorbs AsH₃, B₂H₆, and SiH₄ gases.
 81. The method of claim 79, wherein the first getter is employed for adsorbing the AsH₃ gas when concentration of the AsH₃ gas is detected to exceed a predetermined level.
 82. The method of claim 79, wherein the second getter is employed for adsorbing the B₂H₆ gas when concentration of the B₂H₆ gas is detected to exceed a predetermined level.
 83. The method of claim 79, wherein the first, second, and third getters are sequentially employed, either in a predetermined order or in a random order, when concentration of the SiH₄ gas is detected to exceed a predetermined level.
 84. The method of claim 83, wherein the third getter is first employed, which is followed by employment of the first and second getters. 